Aaron Tobey

Critic

Aaron Tobey is a PhD candidate at the Yale School of Architecture and a freelance designer living in Providence. His dissertation combines media theory, architectural history, and science and technology studies to analyze how early computer use, management thinking and international practice shaped one another within American architectural firms from the 1960s to the 1980s. His previous academic work has explored how information, communication and representation technologies inform collective social imaginations of space and political subject formation. Tobey’s research and writing has been included in Thresholds, the Journal of Architectural Education and Architecture and Culture, and in conferences of the Society of Architectural Historians, Australia and New Zealand and the Architecture, Media, Politics, and Society research initiative, among other venues.

Tobey earned his MArch at RISD and was awarded a 2015 Graduate Studies Grant to conduct field research aboard the container ship ZIM San Francisco and the 2016 Alumni Travel Award to study the border between Israel and Palestine. He obtained his BArch at the University of Cincinnati and also attended the École Spéciale d’Architecture in Paris. He has worked professionally at a number of firms throughout the US including the rendering consultancy Studio AMD in Providence, Fougeron Architecture in San Francisco and Studio LUZ Architects in Boston.
 

Courses

Summer 2024 Courses

FOUND - S101-05 STUDIO:DRAWING
Level Undergraduate
Unit Architecture
Subject Foundation Studies
Period Summer 2024
Credits 3
Format Studio
Mode In-Person
Start date
End date

STUDIO:DRAWING

Level Undergraduate
Unit Architecture
Subject Foundation Studies
Period Summer 2024
Credits 3
Format Studio
Mode In-Person
Start and End 2024-06-27 to 2024-08-08
Times: T | 8:30 AM - 11:30 AM; M | 12:30 PM - 4:30 PM; M | 8:30 AM - 11:30 AM Instructor(s): Aaron Tobey Location(s): Bayard Ewing Building, Room 112 Enrolled / Capacity: 20 Status: Open

SECTION DESCRIPTION

Studio: Drawing is pursued in two directions: as a powerful way to investigate the world, and as an essential activity intrinsic to all artists and designers. As a primary mode of inquiry, drawing is a central means of forming questions and creating knowledge across disciplines. Through wide-ranging drawing approaches, students are prompted to work responsively and self-critically to embrace the unpredictable intersection of process, idea and media. To pursue these larger ideas, the studio becomes a laboratory of varied and challenging activities. Instructors introduce drawing as a dynamic two-dimensional record of sensory search, conceptual thought, or physical action. Students investigate materiality, imagined situations, idea generation, and the translation of the observable world. Formal and intellectual risks are encouraged during a sustained engagement with the possibilities of material, mark-making, perception, abstraction, performance, space and time. As students trust the drawing process, they become more informed about its uncharted potentials, and accept struggle as necessary and positive; they gain confidence in their own sensibilities.

Enrollment is limited to First-Year Students.

Major Requirement | BFA, BArch, MArch (3yr)